ENEE 416: Integrated Circuit (IC) Fabrication Lab (Fall 2011)
Group Activity 2
Assigned: 09/15/11
Due: 09/21/11, 5 p.m.
Group: Ankit Kumar Chaudhari and Musa D Ibrahim
Topic: E-beam Lithography vs. X-ray Lithography
Explain the concepts and fundamentals of each method, its advantages and disadvantages, and its typical applications. Prepare a 10-minute PowerPoint presentation, a 2-3 page report using font Times New Roman 11 ( including figures and references), and 4 problems with solutions. Please e-mail the PowerPoint presentation, the report (in pdf or Word), problems (in pdf or Word) and solutions (in pdf or Word) to Prof. Ghodssi and Mike Fan.