ENEE 416: Integrated Circuit (IC) Fabrication Lab (Fall 2011)

Group Activity 2

Assigned: 09/15/11

Due: 09/21/11, 5 p.m.

Group: Ankit Kumar Chaudhari and Musa D Ibrahim

Topic: E-beam Lithography vs. X-ray Lithography

Explain the concepts and fundamentals of each method, its advantages and disadvantages, and its typical applications. Prepare a 10-minute PowerPoint presentation, a 2-3 page report using font Times New Roman 11 ( including figures and references), and 4 problems with solutions. Please e-mail the PowerPoint presentation, the report (in pdf or Word), problems (in pdf or Word) and solutions (in pdf or Word) to Prof. Ghodssi and Mike Fan.



*E-beam Lithography vs. X-ray Lithography Paper
*E-beam Lithography vs. X-ray Lithography Presentation
*E-beam Lithography vs. X-ray Lithography Questions
*E-beam Lithography vs. X-ray Lithography Solutions