ENEE 416: Integrated Circuit (IC) Fabrication Lab (Fall 2011)

Group Activity 8

Assigned: 11/10/11

Due: 11/16/11, 5 p.m.

Group: Mark Amirtharaj and Zach Kruder

Topic: Double Patterning and Hyper-Numerical Aperture Immersion Lithography

Discuss the concepts between these two lithography techniques and why they are used. Address the concepts and challenges. Describe the typical methods and applications. Prepare a 10-minute PowerPoint presentation, a 2-3 page report using font Times New Roman 11 ( including figures and references), and 4 problems with solutions. Please e-mail the PowerPoint presentation, the report (in pdf or Word), problems (in pdf or Word) and solutions (in pdf or Word) to Prof. Ghodssi and Mike Fan.